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It might be assumed that the damage species arising from electron injection in the oxide for both n-MOS and p-MOS transistors should be identical While it is not possible to prove conclusively that this is so, measurements of the capture cross section made on p-MOS transistors give a value in the mid-10 18 cm 2 range, a value within the experimental error of the values found in electron-generated electron traps in n-MOS transistors Relaxable (Slow) States Nnit Given tie correlation between hot-electron-created oxide electron traps in n-channel transistors, and their counterparts in the p-channel transistors, these traps would be expected to show some evidence of electron detrapping also Brox et al and others have shown that these states do, indeed, detrap.

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39,4 1 The detrapping follows a logarithmic time dependence and that the stronger the negative field on the gate during the detrapping phase (the drain, source, and substrate being grounded), the more rapidly the damage detraps Intermediate Gate Voltage Stressing (Vg = VdI2) Interface States Initially it was thought that electron trapping was the only (or overwhelming) damage mechanism However, the symmetry in the gate oxide injection species (see Figs 62 and 69) suggest that the damage in p-channel transistors should be reflected in the behavior of the gate current, that is, electron trapping at low gate voltages in p-MOS due to the large electron gate current, and interface states and oxide hole traps at h gh gate voltages, where gate hole injection occurs The first indications that mechar isms other than electron trapping might be occurring was shown by Tsuchiya et al 41 in shorter-channel transistors (0.

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25 gtm) at high gate voltages, where he showed that there was a contribution to hot-carrier damage from interface states This damage occurs at high gate voltages and peaks at voltages corresponding approximately to Vg = Vd/2, as can be seen in Fig 612,.

He needed to keep the room in total darkness for most of the work he was doing So there I was, sitting in the dark a large part of the day and wondering what to do about it! Before long, I found a space behind a row of equipment racks in one of the control rooms that flanked the theater-like TV demonstration studio that belonged to the color development group I squeezed my desk into it and there it remained through my entire tenure with RCA John s many contributions to the development of television, from his hands-on participation in placing the antenna on top of the Empire State Building, to his design of the original UHF television broadcasting transmitters that opened up many new channels in the TV spectrum, earned for him the RCA Laboratory s highest honor, The Award for Meritorious Research in Television.

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